Abstract
 

Production of fs Pulses and Micron Beam Spots for High Brightness Electron Beam Applications
S. Anderson
LLNL

 

Current and future applications of high brightness electron beams, which include advanced accelerators and beam-radiation interactions require both transverse and longitudinal beam sizes on the order of tens of microns. Ultra-high density beams may be produced at moderate energy (50 MeV) by compression and subsequent strong focusing of low emittance, photoinjector sources. We describe the implementation of this method used at LLNL?s PLEIADES ICS x-ray source in which the photoinjector-generated beam has been compressed to 300 fsec duration using the velocity bunching technique and focused to 20 µm rms size using an extremely high gradient, permanent magnet quadrupole (PMQ) focusing system.

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