Figure 3
(click on image for figure alone)
Fig. 3. Beam injection against a very negatively biased grid
which reflects all electrons.
Note dark sheath near grid where the electron energy is
decreased below 10 eV.
The electrons stagnate in the dark sheath and form a
convex equipotential surface.
This causes the reflected beam to be highly divergent.
Return to Beam page.
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Dr. Stenzel's page.
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Page maintained by J. Manuel Urrutia
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Last Revision: 25 January 2000.